Irradiation-driven molecular dynamics simulation of the FEBID process for Pt(PF₃)₄

• Alexey Prosvetov,
• Alexey V. Verkhovtsev,
• Gennady Sushko and
• Andrey V. Solov’yov

Beilstein J. Nanotechnol. 2021, 12, 1151–1172, doi:10.3762/bjnano.12.86

• thermal decomposition, while dissociation mechanisms in FEBID are predominantly electron-induced reactions. While primary electron (PE) energies during FEBID are typically between 1 and 30 keV, chemical dissociation is most efficient for low-energy (up to several tens of electronvolts) secondary electrons

Molecular assemblies on surfaces: towards physical and electronic decoupling of organic molecules

• Sabine Maier and
• Meike Stöhr

Beilstein J. Nanotechnol. 2021, 12, 950–956, doi:10.3762/bjnano.12.71

• , photon-induced reactions [46][49][50][51] or electron-induced reactions by electrons from a probe tip [52][53]. In the following, we would like to highlight a few examples for physical properties and built-in functionalities of molecular systems, which were successfully accessed by employing one of the

Electron-driven and thermal chemistry during water-assisted purification of platinum nanomaterials generated by electron beam induced deposition

• Ziyan Warneke,
• Markus Rohdenburg,
• Jonas Warneke,
• Janina Kopyra and
• Petra Swiderek

Beilstein J. Nanotechnol. 2018, 9, 77–90, doi:10.3762/bjnano.9.10

• between contributions of thermal chemistry, direct chemistry between water and the deposit, and electron-induced reactions that all contribute to the purification process. We discuss reaction kinetics for the main volatile products CO and CH4 to obtain mechanistic information. The results provide novel

• insights into the chemistry that occurs during purification of FEBID nanostructures with implications also for the stability of the carbonaceous matrix of nanogranular FEBID materials under humid conditions. Keywords: carbon contamination; electron induced reactions; focused electron beam induced

• -deposition thermal purification processes. This result shows that a combination of ESD and TDS can provide an estimate of the relative contribution of electron-induced and thermal reactions in a given FEBID process. Water- and electron-induced reactions in electron-degraded multilayers of MeCpPtMe3 The fact

Comprehensive investigation of the electronic excitation of W(CO)₆ by photoabsorption and theoretical analysis in the energy region from 3.9 to 10.8 eV

• Mónica Mendes,
• Khrystyna Regeta,
• Filipe Ferreira da Silva,
• Nykola C. Jones,
• Søren Vrønning Hoffmann,
• Gustavo García,
• Chantal Daniel and
• Paulo Limão-Vieira

Beilstein J. Nanotechnol. 2017, 8, 2208–2218, doi:10.3762/bjnano.8.220

• initio molecular dynamics simulations of focused electron beam induced deposition (FEBID) precursor molecules adsorbed on fully and partially hydroxylated SiO2 surfaces [24]. Electron-induced reactions in FEBID processes are initiated by low-energy secondary electrons rather than the high-energy primary

Efficient electron-induced removal of oxalate ions and formation of copper nanoparticles from copper(II) oxalate precursor layers

• Kai Rückriem,
• Sarah Grotheer,
• Henning Vieker,
• Paul Penner,
• André Beyer,
• Armin Gölzhäuser and
• Petra Swiderek

Beilstein J. Nanotechnol. 2016, 7, 852–861, doi:10.3762/bjnano.7.77

• evidence that nanoparticle formation is primarily controlled by the available amount of precursor. Keywords: copper(II) oxalate; electron-induced reactions; layer-by-layer deposition; nanoparticle formation; thin film; Introduction Electron-induced chemistry is a versatile approach to the fabrication of

• likely deteriorate the size distribution after NP formation. We also propose a mechanism of the electron-induced reactions of copper(II) oxalate leading to the removal of oxalate and to the reduction of Cu2+ ions to elemental Cu. Experimental Preparation of copper(II) oxalate surface layers Using a layer

The role of low-energy electrons in focused electron beam induced deposition: four case studies of representative precursors

• Rachel M. Thorman,
• Ragesh Kumar T. P.,
• D. Howard Fairbrother and
• Oddur Ingólfsson

Beilstein J. Nanotechnol. 2015, 6, 1904–1926, doi:10.3762/bjnano.6.194

• induced deposition (FEBID) is a single-step, direct-write nanofabrication technique capable of writing three-dimensional metal-containing nanoscale structures on surfaces using electron-induced reactions of organometallic precursors. Currently FEBID is, however, limited in resolution due to deposition

• be used to elucidate their role. In this context, gas phase studies can obtain well-resolved information on low-energy electron-induced reactions with FEBID precursors by studying isolated molecules interacting with single electrons of well-defined energy. In contrast, ultra-high vacuum surface

• has been verified both by simulations [11] and by experiments [12]. In recent years, it has motivated a number of gas phase studies focusing on the energy dependence of the branching ratios and cross sections for various low energy (0–100 eV) electron-induced reactions with organometallic precursors

Focused electron beam induced deposition: A perspective

• Michael Huth,
• Fabrizio Porrati,
• Christian Schwalb,
• Marcel Winhold,
• Roland Sachser,
• Maja Dukic,
• Jonathan Adams and
• Georg Fantner

Beilstein J. Nanotechnol. 2012, 3, 597–619, doi:10.3762/bjnano.3.70

• from a broader perspective, FEBID still has to live up to the original idea of providing a tool for electron-controlled chemistry on the nanometer scale. This has to be understood in the sense that, by providing a suitable environment during the FEBID process, the outcome of the electron-induced

• reactions can be steered in a controlled way towards yielding the desired composition of the products. The development of a FEBID-specialized surface chemistry is mostly still in its infancy. Next to application development, it is this aspect that will likely be a guiding light for the future development of